Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices

Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT

Saved in:
Bibliographic Details
Main Authors: Li, M.F., Yu, H.Y., Hou, Y.T., Kang, J.F., Wang, X.P., Shen, C., Ren, C., Yeo, Y.C., Zhu, C.X., Chan, D.S.H., Chin, A., Kwong, D.L.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/84162
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore
id sg-nus-scholar.10635-84162
record_format dspace
spelling sg-nus-scholar.10635-841622024-11-14T08:59:51Z Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices Li, M.F. Yu, H.Y. Hou, Y.T. Kang, J.F. Wang, X.P. Shen, C. Ren, C. Yeo, Y.C. Zhu, C.X. Chan, D.S.H. Chin, A. Kwong, D.L. ELECTRICAL & COMPUTER ENGINEERING International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 1 366-371 2014-10-07T04:49:30Z 2014-10-07T04:49:30Z 2004 Conference Paper Li, M.F.,Yu, H.Y.,Hou, Y.T.,Kang, J.F.,Wang, X.P.,Shen, C.,Ren, C.,Yeo, Y.C.,Zhu, C.X.,Chan, D.S.H.,Chin, A.,Kwong, D.L. (2004). Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices. International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT 1 : 366-371. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/84162 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
description International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT
author2 ELECTRICAL & COMPUTER ENGINEERING
author_facet ELECTRICAL & COMPUTER ENGINEERING
Li, M.F.
Yu, H.Y.
Hou, Y.T.
Kang, J.F.
Wang, X.P.
Shen, C.
Ren, C.
Yeo, Y.C.
Zhu, C.X.
Chan, D.S.H.
Chin, A.
Kwong, D.L.
format Conference or Workshop Item
author Li, M.F.
Yu, H.Y.
Hou, Y.T.
Kang, J.F.
Wang, X.P.
Shen, C.
Ren, C.
Yeo, Y.C.
Zhu, C.X.
Chan, D.S.H.
Chin, A.
Kwong, D.L.
spellingShingle Li, M.F.
Yu, H.Y.
Hou, Y.T.
Kang, J.F.
Wang, X.P.
Shen, C.
Ren, C.
Yeo, Y.C.
Zhu, C.X.
Chan, D.S.H.
Chin, A.
Kwong, D.L.
Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices
author_sort Li, M.F.
title Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices
title_short Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices
title_full Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices
title_fullStr Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices
title_full_unstemmed Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices
title_sort selected topics on hfo 2 gate dielectrics for future ulsi cmos devices
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/84162
_version_ 1821196234242654208

Similar Items