Selected topics on HfO 2 gate dielectrics for future ULSI CMOS devices

• Main Authors: Li, M.F., Yu, H.Y., Hou, Y.T., Kang, J.F., Wang, X.P., Shen, C., Ren, C., Yeo, Y.C., Zhu, C.X., Chan, D.S.H., Chin, A., Kwong, D.L.
• Other Authors: ELECTRICAL & COMPUTER ENGINEERING
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/84162
• Institution: National University of Singapore

International Conference on Solid-State and Integrated Circuits Technology Proceedings, ICSICT