High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists

High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists

10.1016/j.mee.2007.12.005

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Bibliographic Details
Main Authors: Chatzichristidi, M., Valamontes, E., Argitis, P., Raptis, I., van Kan, J.A., Zhang, F., Watt, F.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
High aspect ratio
Micromachining
Nanomachining
Proton beam writing
Resist stripping
Online Access:http://scholarbank.nus.edu.sg/handle/10635/112605
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Institution: National University of Singapore
Description
Summary:10.1016/j.mee.2007.12.005

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