High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists

High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists

10.1016/j.mee.2007.12.005

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Bibliographic Details
Main Authors:	Chatzichristidi, M., Valamontes, E., Argitis, P., Raptis, I., van Kan, J.A., Zhang, F., Watt, F.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Subjects:	High aspect ratio Micromachining Nanomachining Proton beam writing Resist stripping
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/112605
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore

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