High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists

• Main Authors: Chatzichristidi, M., Valamontes, E., Argitis, P., Raptis, I., van Kan, J.A., Zhang, F., Watt, F.
• Other Authors: PHYSICS
• Format: Article
• Published: 2014
• Subjects: High aspect ratio; Micromachining; Nanomachining; Proton beam writing; Resist stripping
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/112605
• Institution: National University of Singapore

10.1016/j.mee.2007.12.005