High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists

10.1016/j.mee.2007.12.005

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Bibliographic Details
Main Authors:	Chatzichristidi, M., Valamontes, E., Argitis, P., Raptis, I., van Kan, J.A., Zhang, F., Watt, F.
Other Authors:	PHYSICS
Format:	Article
Published:	2014
Subjects:	High aspect ratio Micromachining Nanomachining Proton beam writing Resist stripping
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/112605
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-112605
record_format	dspace
spelling	sg-nus-scholar.10635-1126052023-10-29T21:59:43Z High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists Chatzichristidi, M. Valamontes, E. Argitis, P. Raptis, I. van Kan, J.A. Zhang, F. Watt, F. PHYSICS NUS NANOSCIENCE & NANOTECH INITIATIVE High aspect ratio Micromachining Nanomachining Proton beam writing Resist stripping 10.1016/j.mee.2007.12.005 Microelectronic Engineering 85 5-6 945-948 MIENE 2014-11-28T06:33:22Z 2014-11-28T06:33:22Z 2008-05 Article Chatzichristidi, M., Valamontes, E., Argitis, P., Raptis, I., van Kan, J.A., Zhang, F., Watt, F. (2008-05). High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists. Microelectronic Engineering 85 (5-6) : 945-948. ScholarBank@NUS Repository. https://doi.org/10.1016/j.mee.2007.12.005 01679317 http://scholarbank.nus.edu.sg/handle/10635/112605 000257413400052 Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
topic	High aspect ratio Micromachining Nanomachining Proton beam writing Resist stripping
spellingShingle	High aspect ratio Micromachining Nanomachining Proton beam writing Resist stripping Chatzichristidi, M. Valamontes, E. Argitis, P. Raptis, I. van Kan, J.A. Zhang, F. Watt, F. High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists
description	10.1016/j.mee.2007.12.005
author2	PHYSICS
author_facet	PHYSICS Chatzichristidi, M. Valamontes, E. Argitis, P. Raptis, I. van Kan, J.A. Zhang, F. Watt, F.
format	Article
author	Chatzichristidi, M. Valamontes, E. Argitis, P. Raptis, I. van Kan, J.A. Zhang, F. Watt, F.
author_sort	Chatzichristidi, M.
title	High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists
title_short	High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists
title_full	High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists
title_fullStr	High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists
title_full_unstemmed	High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists
title_sort	high aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/112605
_version_	1781789102058766336

High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists

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