High aspect ratio micro/nano machining with proton beam writing on aqueous developable - easily stripped negative chemically-amplified resists

10.1016/j.mee.2007.12.005

Saved in:
Bibliographic Details
Main Authors: Chatzichristidi, M., Valamontes, E., Argitis, P., Raptis, I., van Kan, J.A., Zhang, F., Watt, F.
Other Authors: PHYSICS
Format: Article
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/112605
Tags: Add Tag
No Tags, Be the first to tag this record!
Institution: National University of Singapore