SIMS backside depth profiling of ultrashallow implants using silicon-on-insulator substrates

SIMS backside depth profiling of ultrashallow implants using silicon-on-insulator substrates

10.1002/sia.1216

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Bibliographic Details
Main Authors: Yeo, K.L., Wee, A.T.S., Liu, R., Ng, C.M., See, A.
Other Authors: INSTITUTE OF ENGINEERING SCIENCE
Format: Article
Published: 2014
Subjects:
Backside SIMS depth profiling
Sample rotation
Secondary ion mass spectrometry
Silicon-on-insulator (SOI)
Online Access:http://scholarbank.nus.edu.sg/handle/10635/113102
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Institution: National University of Singapore

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