Passivation of copper interconnect surfaces with a passivating metal layer
US6100195
Saved in:
Main Authors: | CHAN, LAP, YAP, KUAN PEI, TEE, KHENG CHOK, IP, FLORA S., LOH, WYE BOON |
---|---|
Other Authors: | INSTITUTE OF MICROELECTRONICS |
Format: | Patent |
Published: |
2012
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/32579 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Passivation of copper interconnect surfaces with a passivating metal layer
by: CHAN, LAP, et al.
Published: (2012) -
Hydrostatic stress and hydrostatic stress gradients in passivated copper interconnects
by: Ang, Derrick, et al.
Published: (2011) -
ATOMIC SCALE INTERCONNECTS ON HYDROGEN PASSIVATED SI(100)
by: YAP TIONG LEH
Published: (2015) -
Nondestructive void size determination in copper metallization under passivation
by: Gan, Zhenghao, et al.
Published: (2009) -
Surface passivation investigation on ultra-thin atomic layer deposited aluminum oxide layers for their potential application to form tunnel layer passivated contacts
by: Xin, Zheng, et al.
Published: (2019)