Using the OPC standard for real-time process monitoring and control
10.1109/MS.2005.168
Saved in:
Main Authors: | Liu, J., Lim, K.W., Ho, W.K., Tan, K.C., Tay, A., Srinivasan, R. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/57762 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Using the OPC standard for real-time process monitoring and control
by: Liu, J., et al.
Published: (2014) -
OPC mask simplification using over-designed timing slack of standard cells
by: Qu, Y., et al.
Published: (2014) -
Development of in-situ real-time CD monitoring and control system through PEB process
by: Yang, G., et al.
Published: (2014) -
Design-process integration for performance-based OPC framework
by: Teh, S.-H., et al.
Published: (2014) -
Real-time control of photoresist extinction coefficient uniformity in the microlithography process
by: Tay, A., et al.
Published: (2014)