Modulation of the Ni FUSI workfunction by Yb doping: From midgap to n-type band-edge
Technical Digest - International Electron Devices Meeting, IEDM
Saved in:
Main Authors: | Yu, H.Y., Chen, J.D., Li, M.F., Lee, S.J., Kwong, D.L., Van Dal, M., Kittl, J.A., Lauwers, A., Augendre, E., Kubicek, S., Zhao, C., Bender, H., Brijs, B., Geenen, L., Benedetti, A., Absil, P., Jurczak, M., Biesemans, S. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/71014 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Yb-doped Ni FUSI for the n-MOSFETs gate electrode application
by: Chen, J.D., et al.
Published: (2014) -
Advanced Ni-based FUlly SIlicidation (FUSI) technology for sub-45nm CMOS devices
by: Yu, H.Y., et al.
Published: (2014) -
Demonstration of a new approach towards 0.25V Low-Vt CMOS using Ni-based FUSI
by: Yu, H.Y., et al.
Published: (2014) -
Midgap states induced by Zeeman field and -wave superconductor pairing
by: Jin, Yuanjun, et al.
Published: (2024) -
Experimental and simulation study of the Schottky barrier lowering by substrate doping variation for PtSi source/drain SBFETs
by: Lousberg, G.P., et al.
Published: (2014)