Numerical prediction of the etched profile in pyrolytic laser etching of silicon and gallium arsenide

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

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書目詳細資料
Main Authors:	Wee, T.-S., Lu, Y.-F., Chim, W.-K.
其他作者:	ELECTRICAL ENGINEERING
格式:	Article
出版:	2014
主題:	Carbon tetrachloride Diffused reflection Gallium arsenide Heat conduction analysis Laser etched profile Laser induced temperature profile Numerical laser etching model Pyrolytic laser etching Silicon
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/80845
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	National University of Singapore

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