Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application

Technical Digest - International Electron Devices Meeting, IEDM

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Main Authors:	Yu, X., Zhu, C., Yu, M., Li, M.F., Chin, A., Tung, C.H., Gui, D., Kwong, D.-L.
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/83445
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Institution:	National University of Singapore

id	sg-nus-scholar.10635-83445
record_format	dspace
spelling	sg-nus-scholar.10635-834452024-11-10T18:36:22Z Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application Yu, X. Zhu, C. Yu, M. Li, M.F. Chin, A. Tung, C.H. Gui, D. Kwong, D.-L. ELECTRICAL & COMPUTER ENGINEERING Technical Digest - International Electron Devices Meeting, IEDM 2005 27-30 TDIMD 2014-10-07T04:41:19Z 2014-10-07T04:41:19Z 2005 Conference Paper Yu, X.,Zhu, C.,Yu, M.,Li, M.F.,Chin, A.,Tung, C.H.,Gui, D.,Kwong, D.-L. (2005). Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application. Technical Digest - International Electron Devices Meeting, IEDM 2005 : 27-30. ScholarBank@NUS Repository. 078039268X 01631918 http://scholarbank.nus.edu.sg/handle/10635/83445 NOT_IN_WOS Scopus
institution	National University of Singapore
building	NUS Library
continent	Asia
country	Singapore Singapore
content_provider	NUS Library
collection	ScholarBank@NUS
description	Technical Digest - International Electron Devices Meeting, IEDM
author2	ELECTRICAL & COMPUTER ENGINEERING
author_facet	ELECTRICAL & COMPUTER ENGINEERING Yu, X. Zhu, C. Yu, M. Li, M.F. Chin, A. Tung, C.H. Gui, D. Kwong, D.-L.
format	Conference or Workshop Item
author	Yu, X. Zhu, C. Yu, M. Li, M.F. Chin, A. Tung, C.H. Gui, D. Kwong, D.-L.
spellingShingle	Yu, X. Zhu, C. Yu, M. Li, M.F. Chin, A. Tung, C.H. Gui, D. Kwong, D.-L. Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application
author_sort	Yu, X.
title	Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application
title_short	Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application
title_full	Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application
title_fullStr	Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application
title_full_unstemmed	Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application
title_sort	advanced mosfets using hftaon/sio2 gate dielectric and tan metal gate with excellent performances for low standby power application
publishDate	2014
url	http://scholarbank.nus.edu.sg/handle/10635/83445
_version_	1821200214610935808

Advanced MOSFETs using HfTaON/SiO2 gate dielectric and TaN metal gate with excellent performances for low standby power application

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