On the deformation of a slender bubble in a Carreau-Yasuda liquid in an extensional flow

by Mok, K.R.C., Chia, H.B.R., Favelukis, M.
Published 2014

The impact of boron halo on phosphorus junction formation and stability

by Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Chan, L., Srinivasan, M.P.
Published 2014

Comprehensive model of damage accumulation in silicon

by Mok, K.R.C., Benistant, F., Jaraiz, M., Rubio, J.E., Castrillo, P., Pinacho, R., Srinivasan, M.P.
Published 2014

Experimental and simulation study of the flash lamp annealing for boron ultra-shallow junction formation and its stability

by Mok, K.R.C., Yeong, S.H., Colombeau, B., Benistant, F., Poon, C.H., Chan, L., Srinivasan, M.P.
Published 2014

Bimodal distribution of damage morphology generated by ion implantation

by Mok, K.R.C., Jaraiz, M., Martin-Bragado, I., Rubio, J.E., Castrillo, P., Pinacho, R., Srinivasan, M.P., Benistant, F.
Published 2014

Comprehensive modeling of ion-implant amorphization in silicon

by Mok, K.R.C., Jaraiz, M., Martin-Bragado, I., Rubio, J.E., Castrillo, P., Pinacho, R., Srinivasan, M.P., Benistant, F.
Published 2014

Ion-implant simulations: The effect of defect spatial correlation on damage accumulation

by Mok, K.R.C., Jaraiz, M., Martin-Bragado, I., Rubio, J.E., Castrillo, P., Pinacho, R., Srinivasan, M.P., Benistant, F.
Published 2014

Understanding of carbon/fluorine Co-implant effect on boron-doped junction formed during soak annealing

by Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Chan, L., Ramam, A., Srinivasan, M.P.
Published 2014

The impact of nitrogen co-implantation on boron ultra-shallow junction formation and underlying physical understanding

by Yeong, S.H., Colombeau, B., Mok, K.R.C., Benistant, F., Liu, C.J., Wee, A.T.S., Dong, G., Chan, L., Srinivasan, M.P.
Published 2014

Modeling and simulation of the influence of SOI structure on damage evolution and ultra-shallow junction formed by Ge preamorphization implants and solid phase epitaxial regrowth

by Mok, K.R.C., Colombeau, B., Jaraiz, M., Castrillo, P., Rubio, J.E., Pinacho, R., Srinivasan, M.P., Benistant, F., Martin-Bragado, I., Hamilton, J.J.
Published 2014

An extensive study on the boron junctions formed by optimized pre-spike∕multiple-pulse flash lamp annealing schemes : junction formation, stability and leakage

by Tan, Dexter Xue Ming, Pey, Kin Leong, Yeong, S. H., Colombeau, B., Poon, C. H., Mok, K. R. C., See, A., Benistant, F., Ng, C. M., Chan, L., Srinivasan, M. P.
Published 2019

Understanding of boron junction stability in preamorphized silicon after optimized flash annealing

by Yeong, S.H., Colombeau, B., Poon, C.H., Mok, K.R.C., See, A., Benistant, F., Tan, D.X.M., Pey, K.L., Ng, C.M., Chan, L., Srinivasan, M.P.
Published 2014