Direct simulation Monte Carlo method of deposition processes

• المؤلف الرئيسي: Tan, Chee Hong.
• مؤلفون آخرون: Zhao, Yong
• التنسيق: Theses and Dissertations
• اللغة: English
• منشور في: 2008
• الموضوعات: DRNTU::Engineering::Computer science and engineering::Computing methodologies::Simulation and modeling; DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• الوصول للمادة أونلاين: http://hdl.handle.net/10356/13523
• المؤسسة: Nanyang Technological University

Modifications had been done on the basic DSMC2.fortran program developed by G. A. Bird to approximate the initial deposition profile characteristic of a physical vapor deposition process, whereby little or no surface chemical reaction occurs. In this report, initial deposition growth of PVD Aluminum...