Reactive sputtering of CoZrTaOx thin films
As a novel metal oxide material with promising electrical properties, CoZrTaOx (OCZT) requires precise control of conditons in the reactive sputtering process to ensure that deposited thin films demonstrate stable and favorable qualities. As the properties of OCZT thin films to process conditions is...
Saved in:
Main Author: | Zheng, Cheng |
---|---|
Other Authors: | Gan Chee Lip |
Format: | Final Year Project |
Language: | English |
Published: |
Nanyang Technological University
2022
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/159239 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
Ordered boron nitride thin film growth with reactive magnetron sputtering
by: Loh, Li Quan
Published: (2017) -
Formation and characterization of magnetron sputtered Ta–Si–N–O thin films
by: Xu, S., et al.
Published: (2012) -
Performance enhancement of transparent amorphous IGZO thin-film transistor realized by sputtered amorphous AlOx passivation layer
by: Li, Yuanbo, et al.
Published: (2022) -
Development of sputtered SrBi2Ta2O9 thin films for nonvolatile random access memory application
by: Li, Yibin
Published: (2008) -
A study on the orientated growth, microstructure and thermal conductivity of RF reactively sputtered AIN films
by: Cheng, Hao
Published: (2008)