Experimental study of copper contamination in VLSI technology

• Main Author: Tey, Shih Hwee.
• Other Authors: Prasad, Krishnamachar
• Format: Theses and Dissertations
• Published: 2008
• Subjects: DRNTU::Engineering::Electrical and electronic engineering::Electric apparatus and materials
• Online Access: http://hdl.handle.net/10356/3568
• Institution: Nanyang Technological University

This thesis records the details of two investigations that were performed. The first investigation, believed to be the first of its kind, was on the study of the feasibility of using second harmonic microscopy (SHM) to measure copper concentration and possible diffusion mechanisms at the surfaces an...