Characterization of silicon nanocrystals embedded in SiO2 matrix
In this thesis, we have synthesized Si nanocrystals (nc-Si) embedded in SiO2 films by implanting Si+ into SiO2 films that are thermally grown on Si substrates.
Saved in:
Main Author: | Liu, Yang |
---|---|
Other Authors: | Chen Tupei |
Format: | Theses and Dissertations |
Published: |
2008
|
Subjects: | |
Online Access: | https://hdl.handle.net/10356/4750 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Similar Items
-
Thermal annealing effect on the band gap and dielectric functions of silicon nanocrystals embedded in SiO2 matrix
by: Ding, Liang, et al.
Published: (2010) -
Static dielectric constant of isolated silicon nanocrystals embedded in a SiO2 thin film
by: Ng, Chi Yung, et al.
Published: (2010) -
Visualizing charge transport in silicon nanocrystals embedded in SiO2 films with electrostatic force microscopy
by: Lau, Hon Wu, et al.
Published: (2010) -
Influence of silicon-nanocrystal distribution in SiO2 matrix on charge injection and charge decay
by: Tseng, Ampere A., et al.
Published: (2010) -
Influence of nanocrystal size on optical properties of Si nanocrystals embedded in SiO2 synthesized by Si ion implantation
by: Tan, M. C., et al.
Published: (2010)