Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy

Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA

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Main Authors: Pey, K.L., Tung, C.H., Tang, L.J., Ranjan, R., Radhakrishnan, M.K., Lin, W.H., Lombardo, S., Palumbo, F.
Other Authors: INSTITUTE OF MICROELECTRONICS
Format: Conference or Workshop Item
Published: 2014
Online Access:http://scholarbank.nus.edu.sg/handle/10635/112981
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1129812015-01-05T21:25:03Z Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy Pey, K.L. Tung, C.H. Tang, L.J. Ranjan, R. Radhakrishnan, M.K. Lin, W.H. Lombardo, S. Palumbo, F. INSTITUTE OF MICROELECTRONICS Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA 11-16 2014-11-28T08:12:57Z 2014-11-28T08:12:57Z 2004 Conference Paper Pey, K.L.,Tung, C.H.,Tang, L.J.,Ranjan, R.,Radhakrishnan, M.K.,Lin, W.H.,Lombardo, S.,Palumbo, F. (2004). Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy. Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA : 11-16. ScholarBank@NUS Repository. http://scholarbank.nus.edu.sg/handle/10635/112981 NOT_IN_WOS Scopus
institution National University of Singapore
building NUS Library
country Singapore
collection ScholarBank@NUS
description Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA
author2 INSTITUTE OF MICROELECTRONICS
author_facet INSTITUTE OF MICROELECTRONICS
Pey, K.L.
Tung, C.H.
Tang, L.J.
Ranjan, R.
Radhakrishnan, M.K.
Lin, W.H.
Lombardo, S.
Palumbo, F.
format Conference or Workshop Item
author Pey, K.L.
Tung, C.H.
Tang, L.J.
Ranjan, R.
Radhakrishnan, M.K.
Lin, W.H.
Lombardo, S.
Palumbo, F.
spellingShingle Pey, K.L.
Tung, C.H.
Tang, L.J.
Ranjan, R.
Radhakrishnan, M.K.
Lin, W.H.
Lombardo, S.
Palumbo, F.
Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy
author_sort Pey, K.L.
title Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy
title_short Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy
title_full Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy
title_fullStr Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy
title_full_unstemmed Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy
title_sort structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/112981
_version_ 1681094582001991680

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