Structural analysis of breakdown in ultrathin gate dielectrics using transmission electron microscopy

• Main Authors: Pey, K.L., Tung, C.H., Tang, L.J., Ranjan, R., Radhakrishnan, M.K., Lin, W.H., Lombardo, S., Palumbo, F.
• Other Authors: INSTITUTE OF MICROELECTRONICS
• Format: Conference or Workshop Item
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/112981
• Institution: National University of Singapore

Proceedings of the International Symposium on the Physical and Failure Analysis of Integrated Circuits, IPFA