Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides
Annual Proceedings - Reliability Physics (Symposium)
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2014
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sg-nus-scholar.10635-1129822024-11-09T03:27:06Z Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides Palumbo, F. Lombardo, S. Pey, K.L. Tang, L.J. Tung, C.H. Lin, W.H. Radhakrishnan, M.K. Falci, G. INSTITUTE OF MICROELECTRONICS Annual Proceedings - Reliability Physics (Symposium) 583-584 ARLPB 2014-11-28T08:12:58Z 2014-11-28T08:12:58Z 2004 Conference Paper Palumbo, F.,Lombardo, S.,Pey, K.L.,Tang, L.J.,Tung, C.H.,Lin, W.H.,Radhakrishnan, M.K.,Falci, G. (2004). Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides. Annual Proceedings - Reliability Physics (Symposium) : 583-584. ScholarBank@NUS Repository. 00999512 http://scholarbank.nus.edu.sg/handle/10635/112982 NOT_IN_WOS Scopus |
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Annual Proceedings - Reliability Physics (Symposium) |
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INSTITUTE OF MICROELECTRONICS |
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INSTITUTE OF MICROELECTRONICS Palumbo, F. Lombardo, S. Pey, K.L. Tang, L.J. Tung, C.H. Lin, W.H. Radhakrishnan, M.K. Falci, G. |
format |
Conference or Workshop Item |
author |
Palumbo, F. Lombardo, S. Pey, K.L. Tang, L.J. Tung, C.H. Lin, W.H. Radhakrishnan, M.K. Falci, G. |
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Palumbo, F. Lombardo, S. Pey, K.L. Tang, L.J. Tung, C.H. Lin, W.H. Radhakrishnan, M.K. Falci, G. Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides |
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Palumbo, F. |
title |
Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides |
title_short |
Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides |
title_full |
Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides |
title_fullStr |
Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides |
title_full_unstemmed |
Structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides |
title_sort |
structure of the breakdown spot during progressive breakdown of ultra-thin gate oxides |
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2014 |
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http://scholarbank.nus.edu.sg/handle/10635/112982 |
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