Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs

10.1109/TDMR.2004.824374

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Bibliographic Details
Main Authors: Tang, L.J., Pey, K.L., Tung, C.H., Radhakrishnan, M.K., Lin, W.H.
Other Authors: INSTITUTE OF MICROELECTRONICS
Format: Conference or Workshop Item
Published: 2014
Subjects:
Online Access:http://scholarbank.nus.edu.sg/handle/10635/115430
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Institution: National University of Singapore
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spelling sg-nus-scholar.10635-1154302024-11-09T03:27:05Z Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs Tang, L.J. Pey, K.L. Tung, C.H. Radhakrishnan, M.K. Lin, W.H. INSTITUTE OF MICROELECTRONICS Breakdown Dielectric-breakdown-induced epitaxy Gate dielectrics Gate oxide MOSFET 10.1109/TDMR.2004.824374 IEEE Transactions on Device and Materials Reliability 4 1 38-45 2014-12-12T07:15:31Z 2014-12-12T07:15:31Z 2004-03 Conference Paper Tang, L.J., Pey, K.L., Tung, C.H., Radhakrishnan, M.K., Lin, W.H. (2004-03). Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs. IEEE Transactions on Device and Materials Reliability 4 (1) : 38-45. ScholarBank@NUS Repository. https://doi.org/10.1109/TDMR.2004.824374 15304388 http://scholarbank.nus.edu.sg/handle/10635/115430 000220708500007 Scopus
institution National University of Singapore
building NUS Library
continent Asia
country Singapore
Singapore
content_provider NUS Library
collection ScholarBank@NUS
topic Breakdown
Dielectric-breakdown-induced epitaxy
Gate dielectrics
Gate oxide
MOSFET
spellingShingle Breakdown
Dielectric-breakdown-induced epitaxy
Gate dielectrics
Gate oxide
MOSFET
Tang, L.J.
Pey, K.L.
Tung, C.H.
Radhakrishnan, M.K.
Lin, W.H.
Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs
description 10.1109/TDMR.2004.824374
author2 INSTITUTE OF MICROELECTRONICS
author_facet INSTITUTE OF MICROELECTRONICS
Tang, L.J.
Pey, K.L.
Tung, C.H.
Radhakrishnan, M.K.
Lin, W.H.
format Conference or Workshop Item
author Tang, L.J.
Pey, K.L.
Tung, C.H.
Radhakrishnan, M.K.
Lin, W.H.
author_sort Tang, L.J.
title Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs
title_short Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs
title_full Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs
title_fullStr Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs
title_full_unstemmed Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs
title_sort gate dielectric-breakdown-induced microstructural damage in mosfets
publishDate 2014
url http://scholarbank.nus.edu.sg/handle/10635/115430
_version_ 1821187261525393408