Gate Dielectric-Breakdown-Induced Microstructural Damage in MOSFETs
10.1109/TDMR.2004.824374
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Main Authors: | Tang, L.J., Pey, K.L., Tung, C.H., Radhakrishnan, M.K., Lin, W.H. |
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Other Authors: | INSTITUTE OF MICROELECTRONICS |
Format: | Conference or Workshop Item |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/115430 |
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Institution: | National University of Singapore |
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