Rapid thermal annealing assisted stability and efficiency enhancement in a sputter deposited CuO photocathode†

10.1039/c6ra03383k

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Bibliographic Details
Main Authors: Masudy-Panah, S, Siavash Moakhar, R, Chua, C.S, Kushwaha, A, Wong, T.I, Dalapati, G.K
Other Authors: ELECTRICAL AND COMPUTER ENGINEERING
Format: Article
Published: 2020
Subjects:
Online Access:https://scholarbank.nus.edu.sg/handle/10635/180295
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Institution: National University of Singapore

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