Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2

Effects of volatility of etch by-products on surface roughness during etching of metal gates in Cl2

10.1149/1.2799079

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書目詳細資料
Main Authors:	Hwang, W.S., Cho, B.-J., Chan, D.S.H., Lee, S.W., Yoo, W.J.
其他作者:	ELECTRICAL & COMPUTER ENGINEERING
格式:	Article
出版:	2014
在線閱讀:	http://scholarbank.nus.edu.sg/handle/10635/55785
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!
機構:	National University of Singapore

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