Quantitative imaging of local defects in very thin silicon dioxide films at low bias voltage by true oxide electron-beam-induced current

• Main Authors: Lau, W.S., Chan, D.S.H., Phang, J.C.H., Chow, K.W., Pey, K.S., Lim, Y.P., Sane, V., Cronquist, B.
• Other Authors: ELECTRICAL ENGINEERING
• Published: 2014
• Online Access: http://scholarbank.nus.edu.sg/handle/10635/62661
• Institution: National University of Singapore

Journal of Applied Physics