Etching of GaN using Inductively Coupled Plasma

Etching of GaN using Inductively Coupled Plasma

Proceedings of SPIE - The International Society for Optical Engineering

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Bibliographic Details
Main Authors:	Ramam, A., Chua, S.J.
Other Authors:	ELECTRICAL ENGINEERING
Format:	Conference or Workshop Item
Published:	2014
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/81412
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Institution:	National University of Singapore

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