Study of Ge out-diffusion during nickel (Platinum - 0, 5, 10 at.%) germanosilicide formation
Materials Research Society Symposium - Proceedings
Saved in:
Main Authors: | Jin, L.J., Pey, K.L., Choi, W.K., Fitzgerald, E.A., Antoniadis, D.A., Pitera, A.J., Lee, M.L., Chi, D.Z. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/84248 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Effect of Pt on agglomeration and Ge out diffusion in Ni(Pt) germanosilicide
by: Jin, L.J., et al.
Published: (2014) -
Suppression of oxidation in nickel germanosilicides by Pt incorporation
by: Rahman, M.A., et al.
Published: (2014) -
Stability and composition of Ni-germanosilicided Si 1-xGe x films
by: Pey, K.L., et al.
Published: (2014) -
Electrical characterization of platinum and palladium effects in nickel monosilicide/n-Si Schottky contacts
by: Jin, L.J., et al.
Published: (2014) -
The interfacial reaction of Ni with (111)Ge, (100)Si0.75Ge 0.25 and (100)Si at 400 °C
by: Jin, L.J., et al.
Published: (2014)