Performance analysis of HfO2/InAlN/AlN/GaN HEMT with AlN buffer layer for high power microwave applications
We present a performance enhancement evaluation of n þ doped graded InGaN drain/source regionbased HfO2/InAlN/AlN/GaN/AlN on SiC metal-oxide-semiconductor high electron mobility transistor (MOS-HEMTs) with a T-shaped gate. Impact on the device characteristics with the inclusion of a HfO2 surface pas...
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Main Authors: | Murugapandiyan, P., Mohanbabu, A., Lakshmi, V. Rajya, Ramakrishnan, V.N., Varghese, Arathy, Wasim, MOHD, Baskaran, S., Kumar, R. Saravana, Janakiraman, V. |
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格式: | Article |
語言: | English |
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H. : ĐHQGHN
2020
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在線閱讀: | http://repository.vnu.edu.vn/handle/VNU_123/89314 https://doi.org/10.1016/j.jsamd.2020.04.007 |
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