Plasma assisted deposition of Ti-Si-N and Ti-Si-N-O diffusion barrier films

Plasma assisted deposition of Ti-Si-N and Ti-Si-N-O diffusion barrier films

216 p.

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書目詳細資料
主要作者:	Ee, Elden Yong Chiang
其他作者:	Chen Zhong
格式:	Theses and Dissertations
出版:	2010
主題:	DRNTU::Engineering::Materials::Plasma treatment
在線閱讀:	https://hdl.handle.net/10356/35963
標簽:	添加標簽沒有標簽, 成為第一個標記此記錄!

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