Atomic stacking configurations in atomic layer deposited TiN films

• Main Authors: Park, H. S., Lim, B. K., Liang, M. H., Sun, C. Q., Gao, W., Li, Sean, Dong, Zhili
• Other Authors: School of Materials Science & Engineering
• Format: Article
• Language: English
• Published: 2012
• Subjects: DRNTU::Engineering::Materials::Microelectronics and semiconductor materials::Thin films
• Online Access: https://hdl.handle.net/10356/94085; http://hdl.handle.net/10220/7437
• Institution: Nanyang Technological University

Study on the atomic stacking configurations and grain boundary structures of ultrathin nanocrystalline TiN films deposited by the atomic layer deposition technique reveals t...