Effect of a titanium cap in reducing interfacial oxides in the formation of nickel silicide
10.1063/1.1448672
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Main Authors: | Tan, W.L., Pey, K.L., Chooi, S.Y.M., Ye, J.H., Osipowicz, T. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/55736 |
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Institution: | National University of Singapore |
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