Effect of hydrogen partial pressure on optoelectronic properties of indium tin oxide thin films deposited by radio frequency magnetron sputtering method
Journal of Applied Physics
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Main Authors: | Zhang, K., Zhu, F., Huan, C.H.A., Wee, A.T.S. |
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Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
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Online Access: | http://scholarbank.nus.edu.sg/handle/10635/96310 |
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Institution: | National University of Singapore |
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