Development and application of cathodic vacuum arc plasma for nanostructured and nanocomposite film deposition
A cathodic vacuum arc plasma (CVAP) system was constructed at Chiang Mai University to be used for the deposition of nanostructured and nanocomposite thin films. Various CVAP sources were developed, such as with a single or dual-rod cathode. A range of features were implemented including "trigg...
محفوظ في:
المؤلفون الرئيسيون: | M. Medhisuwakul, N. Pasaja, S. Sansongsiri, J. Kuhakan, S. Intarasiri, L. D. Yu |
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التنسيق: | دورية |
منشور في: |
2018
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الوصول للمادة أونلاين: | https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84880569881&origin=inward http://cmuir.cmu.ac.th/jspui/handle/6653943832/47710 |
الوسوم: |
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مواد مشابهة
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Development and application of cathodic vacuum arc plasma for nanostructured and nanocomposite film deposition
بواسطة: Medhisuwakul M., وآخرون
منشور في: (2014) -
Development and application of cathodic vacuum arc plasma for nanostructured and nanocomposite film deposition
بواسطة: Medhisuwakul M., وآخرون
منشور في: (2014) -
Development and application of cathodic vacuum arc plasma for nanostructured and nanocomposite film deposition
بواسطة: M. Medhisuwakul, وآخرون
منشور في: (2018) -
Mo-containing tetrahedral amorphous carbon deposited by dual filtered cathodic vacuum arc with selective pulsed bias voltage
بواسطة: Nitisak Pasaja, وآخرون
منشور في: (2018) -
Filtered cathodic arc deposition with ion-species-selective bias
بواسطة: Anders A., وآخرون
منشور في: (2014)