Time evolution study of Ar/N₂ plasma-activated Cu surface for Cu-Cu direct bonding in a non-vacuum environment

In this paper, a two-step copper-copper direct bonding process in a non-vacuum environment is reported. Time-dependent evolution of argon/nitrogen plasma-activated copper surface is carefully studied. A multitude of surface characterizations are performed to investigate the evolution of the copper s...

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Bibliographic Details
Main Authors: Hu, Liangxing, Goh, Simon Chun Kiat, Tao, Jing, Lim, Yu Dian, Zhao, Peng, Lim, Michael Joo Zhong, Salim, Teddy, Velayutham, Uvarajan M., Tan, Chuan Seng
Other Authors: School of Electrical and Electronic Engineering
Format: Article
Language:English
Published: 2021
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Online Access:https://hdl.handle.net/10356/153397
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Institution: Nanyang Technological University
Language: English

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