Gate-all-around vertical silicon nanowire (GAA-VSiNW) fets : junction and threshold voltage engineering for optimum performance and scalability
Gate-All-Around (GAA) Silicon nanowire (SiNW) is a structure with virtually “infinite” number of gates in close vicinity to the channel to provide the best gate-to-channel electrostatic control, and therefore drastically reduces the parasitic short channel effects leading to lower power dissipation...
Saved in:
Main Author: | Lu, Weijie |
---|---|
Other Authors: | Tan Chuan Seng |
Format: | Theses and Dissertations |
Language: | English |
Published: |
2017
|
Subjects: | |
Online Access: | http://hdl.handle.net/10356/69465 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
Gate-all-around silicon nanowire FET modeling
by: Chen, Xiangchen
Published: (2014) -
Gate-all-around nanowire FET sensors with ultrahigh sensitivity and low noise
by: Pushpapraj Singh
Published: (2012) -
A junctionless gate-all-around silicon nanowire FET of high linearity and its potential applications
by: Wang, T., et al.
Published: (2014) -
Nickel-silicided Schottky junction CMOS transistors with gate-all-around nanowire channels
by: Tang, L. J., et al.
Published: (2012) -
Nanowire FETs for Low Power CMOS Applications Featuring Novel Gate-All-Around Single Metal FUSI Gates with Dual φ m and v T Tune-ability
by: Jiang, Y., et al.
Published: (2014)