Area selective atomic layer deposition (AS-ALD) for electronic device applications

• Main Author: Mayank Rajput
• Other Authors: Nripan Mathews
• Format: Theses and Dissertations
• Language: English
• Published: 2018
• Subjects: DRNTU::Engineering::Electrical and electronic engineering
• Online Access: http://hdl.handle.net/10356/73109
• Institution: Nanyang Technological University

Due to the continuous shrinking of microelectronic devices, nanoscale materials are being deposited and stacked into the high density multilayer structures (e.g. 3D-FETs, interconnects, core shell structures, etc). However, advanced and novel process methods are required for the fabrication of these...