NANOFABRICATION USING OPTIMIZED PROTON BEAM WRITING AND MASKED ION LITHOGRAPHY

NANOFABRICATION USING OPTIMIZED PROTON BEAM WRITING AND MASKED ION LITHOGRAPHY

Ph.D

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Bibliographic Details
Main Author:	SARFRAZ QURESHI
Other Authors:	PHYSICS
Format:	Theses and Dissertations
Language:	English
Published:	2019
Subjects:	Proton Beam Writing, Nanofabrication, Beam focusing, Imaging, Secondary electrons, Masked Ion Lithography
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/151261
Tags:	Add Tag No Tags, Be the first to tag this record!
Institution:	National University of Singapore
Language:	English

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