Enhancement of Raman signals from low-k dielectrics with angle-resolved light scattering on nanostructure patterned Cu/low-k interconnects of IC devices

• Main Authors: Huang, M.Y.M, Liu, B, Tan, P.K, Lam, J.C.K, Mai, Z
• Other Authors: ELECTRICAL AND COMPUTER ENGINEERING
• Format: Article
• Published: AVS Science and Technology Society 2020
• Subjects: Characterization; Integrated circuit interconnects; Integrated circuits; Interdiffusion (solids); Light scattering; Nanostructures; Raman spectroscopy; Semiconductor device manufacture; Angle-resolved light scattering; Cu/low-k interconnects; Incident laser light; Integrated circuit devices; Low-k dielectric materials; Nanometer scale structure; Semiconductor technology; Surface plasmon effects; Dielectric materials
• Online Access: https://scholarbank.nus.edu.sg/handle/10635/180084
• Institution: National University of Singapore

10.1116/1.4905939