Method for fabricating semiconductor devices with shallow diffusion regions

Method for fabricating semiconductor devices with shallow diffusion regions

US8101487

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Bibliographic Details
Main Authors:	TAN, DEXTER XUEMING, COLOMBEAU, BENJAMIN, ONG, CLARK KUANG KIAN, YEONG, SAI HOOI, NG, CHEE MANG, PEY, KIN LEONG
Other Authors:	ELECTRICAL & COMPUTER ENGINEERING
Format:	Patent
Published:	2012
Online Access:	http://scholarbank.nus.edu.sg/handle/10635/32808
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Institution:	National University of Singapore

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