Critical dimension and real-time temperature control for warped wafers

Critical dimension and real-time temperature control for warped wafers

10.1016/j.jprocont.2007.11.009

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Bibliographic Details
Main Authors: Ho, W.K., Tay, A., Fu, J., Chen, M., Feng, Y.
Other Authors: ELECTRICAL & COMPUTER ENGINEERING
Format: Article
Published: 2014
Subjects:
Critical dimension
Lithography
Real-time control
Wafer warpage
Online Access:http://scholarbank.nus.edu.sg/handle/10635/55471
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Institution: National University of Singapore

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