Structural and morphological qualities of InGaN grown via elevated pressures in MOCVD on AlN/Si(111) substrates
10.1016/j.jcrysgro.2013.08.016
Saved in:
Main Authors: | Ho, J.W., Zhang, L., Wee, Q., Tay, A.A.O., Heuken, M., Chua, S.-J. |
---|---|
其他作者: | ELECTRICAL & COMPUTER ENGINEERING |
格式: | Article |
出版: |
2014
|
主題: | |
在線閱讀: | http://scholarbank.nus.edu.sg/handle/10635/83094 |
標簽: |
添加標簽
沒有標簽, 成為第一個標記此記錄!
|
相似書籍
-
InGaN multiple quantum wells grown on ELO GaN templates and the optical properties characterization
由: Zhou, H., et al.
出版: (2014) -
Structural analysis of metalorganic chemical vapor deposited AIN nucleation layers on Si (1 1 1)
由: Zang, K.Y., et al.
出版: (2014) -
Characterisation of defects generated during constant current InGaN-on-silicon LED operation
由: Made, Riko I, et al.
出版: (2017) -
Effect of light wavelengths on the non-polar InGaN-based thin film solar cells performances using one-dimensional modeling
由: Madi, Lourassi, et al.
出版: (2019) -
MOCVD growth and characterization of InGaN quantum structures
由: ZHANG JI
出版: (2010)