Phosphorus implant for S/D extension formation: Diffusion and activation study after spacer and spike anneal

Phosphorus implant for S/D extension formation: Diffusion and activation study after spacer and spike anneal

AIP Conference Proceedings

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Bibliographic Details
Main Authors: Yeong, S.H., Colombeau, B., Benistant, F., Srinivasan, M.P., Mulcahy, C.P.A., Lee, P.S., Chan, L.
Other Authors: CHEMICAL & BIOMOLECULAR ENGINEERING
Format: Conference or Workshop Item
Published: 2014
Subjects:
Ge-pai
Halo implant
Phosphorus
Spacer anneal
SPER
Spike anneal
Online Access:http://scholarbank.nus.edu.sg/handle/10635/90681
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Institution: National University of Singapore

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