Investigation of molybdenum-carbon films (Mo-C:H) deposited using an electron cyclotron resonance chemical vapor deposition system
Journal of Applied Physics
Saved in:
Main Authors: | Rusli, Yoon, S.F., Huang, Q.F., Yang, H., Yu, M.B., Ahn, J., Zhang, Q., Teo, E.J., Osipowicz, T., Watt, F. |
---|---|
Other Authors: | PHYSICS |
Format: | Article |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/96979 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Characteristics of nickel-containing carbon films deposited using electron cyclotron resonance CVD
by: Huang, Q.F., et al.
Published: (2014) -
Effects of microwave power on the structural and emission properties of hydrogenated amorphous silicon carbide deposited by electron cyclotron resonance chemical vapor deposition
by: Cui, J., et al.
Published: (2014) -
Hydrogenated amorphous silicon carbide deposition using electron cyclotron resonance chemical vapor deposition under high microwave power and strong hydrogen dilution
by: Chew, K., et al.
Published: (2014) -
Tungsten-carbon thin films deposited using screen grid technique in an electron cyclotron resonance chemical vapour deposition system
by: Rusli, et al.
Published: (2014) -
Deposition of polymeric nitrogenated amorphous carbon films (a-C:H:N) using electron cyclotron resonance CVD
by: Yoon, S.F., et al.
Published: (2014)