Integrated approach for low-temperature synthesis of high-quality silicon nitride films in PECVD using RF-UHF hybrid plasmas

© 2016 IOP Publishing Ltd. This study investigates low-temperature plasma nitriding of hydrogenated silicon (SiNx:H) film in radio frequency (RF) and RF-ultra-high frequency (UHF) hybrid plasmas. To study the optimized conditions for the deposition of SiNX:H film, this work adopts a systematic plasm...

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Bibliographic Details
Main Authors: B. B. Sahu, Kyung S. Shin, Jeon G. Han
Format: Journal
Published: 2018
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Online Access:https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=84957895200&origin=inward
http://cmuir.cmu.ac.th/jspui/handle/6653943832/56306
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Institution: Chiang Mai University

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