Electrical and structural characterization of GaN based semiconductor layers
Gallium nitride (GaN) has gained the interest of both the academics and electronic companies in recent years, and is seen as a promising material for both optoelectronics devices in the blue-ultraviolent range and high power and high frequency HEMT devices. This is due to its high breakdown voltage,...
Saved in:
Main Author: | Lee, Pui Ki. |
---|---|
Other Authors: | K Radhakrishnan |
Format: | Final Year Project |
Language: | English |
Published: |
2011
|
Subjects: | |
Online Access: | http://hdl.handle.net/10356/42843 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | Nanyang Technological University |
Language: | English |
Similar Items
-
Characterization of GaN-based semiconductor materials for device applications
by: Ng, Yao Heng.
Published: (2009) -
Studies of Gallium Nitride Electron Mobility Transistors (GaN HEMTs) and GaN Metal-Insulator-Semiconductor (GaN MISHEMT)
by: Lau, Sien Hui
Published: (2020) -
Electrical characterization of GaN-based layer structures
by: Firdous Banu
Published: (2011) -
Characterization of GaN-based HEMT structures for high power applications
by: Pang, Shi Xiang.
Published: (2013) -
Studies of GaN-on-GaN vertical Schottky diodes for radiation sensing applications
by: Sandupatla, Abhinay
Published: (2020)