Ni-alloy silicides for advanced Si technologies

This work focuses on the study of Ni- and Ni-alloy silicides to develop a suitable silicidation technology for the integration into future complementary metal-oxide-semiconductor (CMOS) devices. In the self-aligned silicidation process, metal silicide is formed not only on the single crystalline sou...

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Bibliographic Details
Main Author: Chaw, Joanna Yane Yin.
Other Authors: Pey, Kin Leong
Format: Theses and Dissertations
Published: 2008
Subjects:
Online Access:http://hdl.handle.net/10356/4464
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Institution: Nanyang Technological University

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