Growth mechanisms in thin film epitaxy of Si/SiGe from hydrides

10.1016/S0921-5107(01)00842-X

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Bibliographic Details
Main Authors: Zhang, J., Woods, N.J., Breton, G., Price, R.W., Hartell, A.D., Lau, G.S., Liu, R., Wee, A.T.S., Tok, E.S.
Other Authors: MATERIALS SCIENCE
Format: Conference or Workshop Item
Published: 2014
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Online Access:http://scholarbank.nus.edu.sg/handle/10635/113115
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Institution: National University of Singapore

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