Process optimization for multiple-pulses laser annealing for boron implanted silicon with germanium pre-amorphization
Materials Research Society Symposium - Proceedings
Saved in:
Main Authors: | Poon, D., Cho, B.J., Lu, Y.F., Tan, L.S., Bhat, M., See, A. |
---|---|
Other Authors: | ELECTRICAL & COMPUTER ENGINEERING |
Format: | Conference or Workshop Item |
Published: |
2014
|
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/71512 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Institution: | National University of Singapore |
Similar Items
-
Multiple-pulse laser annealing of boron-implanted preamorphized silicon and the process optimization
by: Cho, B.J., et al.
Published: (2014) -
Multiple-pulse laser annealing of preamorphized silicon for ultrashallow boron junction formation
by: Poon, C.H., et al.
Published: (2014) -
Boron profile narrowing in laser-processed silicon after rapid thermal anneal
by: Poon, C.H., et al.
Published: (2014) -
Pulsed laser annealing of ultra-shallow junctions in silicon-germanium
by: Tan, L.S., et al.
Published: (2014) -
Formation of Ultra-Shallow Junctions in Silicon- Germanium by Pulsed Laser Annealing
by: ABIDHA BEGUM
Published: (2010)