The development of a highly selective KI/I2/H2O/H2SO4 etchant for the selective etching of Al0.3Ga0.7As over GaAs
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers
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Main Authors: | Lau, W.S., Chor, E.F., Kek, S.P., Abdul Aziz, W.H.B., Lim, H.C., Heng, C.H., Zhao, R. |
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Other Authors: | ELECTRICAL ENGINEERING |
Format: | Article |
Published: |
2014
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Subjects: | |
Online Access: | http://scholarbank.nus.edu.sg/handle/10635/81248 |
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Institution: | National University of Singapore |
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